The 7th International Workshop on Advanced Patterning Solutions opened in Lishui, a city in East China's Zhejiang province, on Oct 25, and attracted more than 700 participants from the semiconductor industry at home and abroad.

The workshop aims to promote the exchange and cooperation on the latest technologies and methods for advanced nodes in the patterning field, which is the foundation of integrated circuit chips and modern industrial technology, according to Cao Jianlin, chairman of the China Integrated Circuit Innovation Alliance.

The event features keynote speeches and panel discussions by experts and scholars from leading companies, institutions, and universities in the semiconductor sector, such as ASML China, FUJIFILM, SMIC, Fudan University, and East China Normal University.

Initiated in 2017, the workshop has become an important platform for technical communication and interaction among domestic and foreign semiconductor professionals. It also showcases China's rapid development and innovation in the integrated circuit industry and its efforts to narrow the gap with the highest international standards.

Lishui was selected as the host city for this year's workshop because of its remarkable achievements in developing a distinctive semiconductor industry cluster in recent years.

The Lishui Economic and Technological Development Zone has over the past few years attracted 33 semiconductor industry projects that represent a combined investment of nearly 60 billion yuan ($8.22 billion). It has formed a complete industry chain covering semiconductor equipment, chip design, packaging, and testing, as well as semiconductor materials and power device production.